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| On the wear mechanism of thin nickel film during AFM-based scratching process using molecular dynamics
Hanif Muhammad Khan and Sung-Gaun Kim*
The Journal of Mechanical Science and Technology, vol. 25, no. 8, pp.2111-2120, 2011
Abstract : We report a study on monocrystalline nickel thin films using the atomic force microscope (AFM) based scratching process to understand
the associated wear mechanism. As for the nano level fabrication, better understanding of abrasive wear mechanism is a prerequisite.
A three-dimensional molecular dynamics (MD) study has been performed and we have used a new parameter wear volume to
distinguish between different wear zones. A reduced number of zones have been proposed to understand the wear mechanism during
nanoscratching process. Also, centrosymmetry parameter has been used to validate the findings.
Keyword : AFM; Molecular dynamics; Nano scratching; NEMS; Nickel; Wear volume |
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