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Intrinsic stress, mismatch strain, and self-assembly during deposition of thin films subjected to an externally applied force
Sang-Hyun Kim
The Journal of Mechanical Science and Technology, vol. 22, no. 11, pp.2048-2055, 2008
Abstract : A relation is derived between the mismatch strain, the film thickness, and the displacement of a linear elastic structure
under external loading during material deposition. If any two of these variables can be experimentally determined,
then the remaining variable can be determined. The method allows one to experimentally determine the mismatch
strain by measuring the film thickness and the displacement of a point on the structure that is not undergoing deposition.
The intrinsic stresses can be used to self-assemble microstructures during material deposition. Assembly of two components
is considered: one component is subjected to deposition and is modeled as an Euler-Bernoulli beam, and the
other component is not subjected to deposition and is modeled as a linear spring. For the purposes of this paper, the
definition of assembly requires that the beam do work on the spring. The analysis is experimentally verified by electroplating
nickel onto an AFM cantilever beam in contact with a second AFM beam (serving as the spring) that does not
undergo deposition.
Keyword : Intrinsic stress; Mismatch strain; Self-Assembly; Electroplated nickel; Electrodeposition |
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