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| Multi-layer alignment control of a large area nano-imprinting stage Hong Jae Yim
The Journal of Mechanical Science and Technology, vol. 23, no. 4, pp.1094-1097, 2009
Abstract : An XYθ stage for large area UV Nano-Imprinting Lithography (UV-NIL), which consists of linear actuators, translational/
revolute joints, etc., has been modeled as flexible bodies. Multi-layer alignment control for the translation and
angle offset cancellation has been performed in a virtual simulation environment using both ADAMS/Control and
Matlab/SIMULINK. Furthermore, the vertical motions of three and four axis stages during the control action have been
analyzed and compared to each other. The performed analysis can provide useful information for a high precision NIL
stage development in the future.
Keyword :
UV Nano-imprinting lithography; Stage; Multi-layer alignment control; Simulation
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TEL: +82-2-501-3605, E-mail: editorial@j-mst.org |
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